Transport Phenomena in Partially Ionized Plasma by Vladimir A. Rozhansky, ISBN 9056990381
Transport phenomena in plasmas are the relatively slow process of particle, momentum and energy transport in systems in a state of mechanical equilibrium. In contrast to neutral gases, these phenomena in plasmas are greatly influenced by self-consistent fields in particular electric fields. These can produce particle and energy fluxes, in addition to those generated by the homogeneity of the plasma composition and temperature. As a result, the physical effects accompanying transport phenomena in plasmas are far more numerous and complicated than those in neutral gases, and the solution of corresponding problems is more difficult. The effects however, are usually far more interesting and sometimes surprising.
Presenting a systematic survey and analysis of the main mechanism of transport phenomena in plasma this book also gives examples of gradually increasing complexity to illustrate these mechanisms and the relationships between them. Special attention is paid to the analysis of experimental measurements, and the relevant processes are considered analytically as well as qualitatively.
Many of the problems dealt with are of considerable practical interest, and the phenomena described often determine the main characteristics of processes and devices. Therefore this book will be of interest to researchers who need to know the properties of real, specific systems, as well as to engineers and advanced students in the physics of plasmas, semiconductors, various types of gas discharges and the ionosphere.
Chemical Physics of Thin Film Deposition Processes for Micro and Nano Technologies by Yves Pauleau, ISBN 1402005253
An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.
Chemical Physics of Thin Film Deposition Processes for Micro and Nano Technologies by Yves Pauleau, ISBN 1402005253 
Plasma tv > Chemical Physics of Thin Film Deposition Processes for Micro and Nano Technologies by Yves Pauleau, ISBN 1402005253
Relativistic Fluids And Magneto-fluids: With Applications in Astrophysics And Plasma Physics
Relativistic Fluids And Magneto-fluids: With Applications in Astrophysics And Plasma Physics
Plasma tv > Relativistic Fluids And Magneto-fluids: With Applications in Astrophysics And Plasma Physics
Basic Data of Plasma Physics: The Fundamental Data on Electrical Discharges in Gases
Basic Data of Plasma Physics: The Fundamental Data on Electrical Discharges in Gases
Plasma tv > Basic Data of Plasma Physics: The Fundamental Data on Electrical Discharges in Gases
Plasma Physics for Astrophysics
"Russell Kulsrud has written an outstanding text that should raise the appreciation of plasma astrophysics within the general astronomy community at a time when the influence of plasma processes on what we observe is recognized to be of paramount importance."--Roger D. Blandford, Kavli Institute for Particle Astrophysics and Cosmology, Stanford University
"Perhaps the most important feature of this book is its pedagogical approach: its emphasis of physical understanding over detailed mathematics. Simple estimates and examples are given instead of rigorous derivations (rigorous results are then quoted). The writing is colloquial and accessible. This is an excellent approach, and it helps demystify a complex subject. Indeed, it is an approach that is lacking in many existing texts in the field.
Plasma Physics for Astrophysics
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