Spectroscopic Measurement: An Introduction to the Fundamentals by Mark A. Linne, ISBN 012451071X
Description
Electromagnetism, quantum mechanics, statistical mechanics, molecular spectroscopy, optics and radiation form the foundations of the field. On top of these rest the techniques applying the fundamentals (e.g. Emission Spectroscopy, Laser Induced Fluorescence, Raman Spectroscopy). This book contains the basic topics associated with optical spectroscopic techniques. About 40 major sources are distilled into one book, so researchers can read and fully comprehend specific optical spectroscopy techniques without visiting many sources.
Importance of This Topic
Optical diagnostics are widely used in combustion research. Ideas first proposed here are now applied in other fields, including reacting flows for materials production (CVD reactors, oxidation reactors and some plasma work), atmospheric sensing, measuring constituents of exhaled human breath (to indicate stress in airway passages and the lungs and hence, e.g., provide a very early indicator of lung cancer).
Why This Title
To understand what they are doing. Researchers not formally trained who apply spectroscopy in their research need the detail in this book to ensure accuracy of their technique or to develop more sophisticated measurements.
Time is valuable and future research will benefit. Learning "on the fly" can involve direct information on a specific diagnostic technique rather than gaining the background necessary to go into further depth.
Emerging Applications of Vacuum-ARC-Produced Plasma, Ion and Electron Beams by Efim Oks, ISBN 1402010664
Emerging Applications of Vacuum-ARC-Produced Plasma, Ion and Electron Beams by Efim Oks, ISBN 1402010664 
Plasma tv > Emerging Applications of Vacuum-ARC-Produced Plasma, Ion and Electron Beams by Efim Oks, ISBN 1402010664
Fundamental Electron Interactions with Plasma Processing Gases
This volume deals with the basic knowledge and understanding of the fundamental interactions of low-energy electrons with molecules. Recent advances in electron-molecule interaction processes are discussed and a unique up-to-date and comprehensive account of the fundamental interactions of low-energy electrons with molecules of current interest in modern technology, specially the semiconductor industry, is presented. The material provided in this volume will aid scientists and engineers working in many fields of basic and applied science and engineering. The unique and authoritative knowledge, information, and understanding it provides generically underpins advances in plasma, laser, lighting, discharge, environmental, radiation, and other technologies.
Fundamental Electron Interactions with Plasma Processing Gases
Plasma tv > Fundamental Electron Interactions with Plasma Processing Gases
Mathematical Physics: Proceedings of the XI Regional Conference
Since 1984, a series of regional conferences on mathematical physics has been organized by physicists from Iran, Pakistan and Turkey to promote the research in mathematical and theoretical physics in the region. This volume, which derives from the XI Regional Conference on Mathematical Physics, comprises 8 review and 44 research articles on the most significant topics in mathematical and theoretical physics such as astrophysics and cosmology, conformal field theory, high energy physics, general relativity and plasma physics. The review articles are comprehensive and self-contained and report on the most important developments in the corresponding subjects. Each review article provides a complete list of references, which is especially useful for graduate students who are just starting their research activities; even ambitious undergraduates in physics can use these review papers as useful background material to go further into the subject and explore the research literature.
Mathematical Physics: Proceedings of the XI Regional Conference
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Chemical Physics of Thin Film Deposition Processes for Micro and Nano Technologies by Yves Pauleau, ISBN 1402005253
An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.
Chemical Physics of Thin Film Deposition Processes for Micro and Nano Technologies by Yves Pauleau, ISBN 1402005253
Plasma tv > Chemical Physics of Thin Film Deposition Processes for Micro and Nano Technologies by Yves Pauleau, ISBN 1402005253